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January 1, 1973Journal of The Electrochemical SocietyOpen Access

The Use of Rutherford Backscattering to Study the Behavior of Ion-Implanted Atoms During Anodic Oxidation of Aluminum: Ar, Kr, Xe, K, Rb, Cs, Cl, Br, and l

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Authors

FBF. BrownWMWilliam D. Mackintosh

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Brown et al. (1973) studied this question.

synapsesocial.com/papers/6a99f284ecbe110cbfaa79efhttps://doi.org/10.1149/1.2403637
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