Features of the formation of aluminum thin films under the influence of ultrasonic vibrations of the substrate

Atomic force and scanning electron microscopy methods were used to study aluminum thin films grown on sitallic substrates. This study is the first to show that ultrasonic vibrations of the substrate during deposition stimulate the formation of islands on the film surface. However, the average height and lateral dimensions of the islands are not significantly affected by ultrasonic perturba-tions of the substrate.