Reconfigurable shadow mask technology: a microsystem for metal nanoline deposition

Reconfigurable shadow mask technology, presented in this paper, introduces the use of microsystems for in situ metal deposition, and direct patterning of structures with micron and submicron lateral and vertical dimensions. A multilayer microstructure acts as a set of addressable active shutters and shadow masks in a physical vapour deposition (PVD) system. Design and fabrication of a microactuator allowing submicron controlled displacements combined with the development of a novel self-aligned multilayer fabrication process allows the deposition of metal nanolines using standard photolithographic exposure tools. Not only does this approach remove the need for nanolithography, it also enables compositional and three-dimensional active in situ variation of the nanolines during deposition. Atomic force microscopy (AFM) and scanning electron microscopy (SEM) are used to characterize three-dimensional structures and deposited nanolines.