Si Deposition from Chlorosilanes: I . Deposition Modeling

Deposition of silicon from chlorosilanes is studied. Based on a model for gas‐phase reactions involving , , , and , the reaction constants for relevant gas‐phase reactions are determined. Deposition is analyzed in two ways: one (effusive flux model) using the surface reaction probabilities of surface reactions, and the other (surface reaction model) derived previously by Korec in terms of surface reactions of . Advantages as well as disadvantages of the two models are discussed by comparing fully numerical results with the experimental results available.