Controlling optics contamination at the PolLux STXM

Contamination of X-ray mirror surfaces by carbon is a common issue that can significantly degrade the optical performance of the instrument. The effects can be severe at photon energies near the carbon K-edge (ca. 300 eV), where the X-rays are strongly attenuated, but also significant at higher photon energies where the carbon coating affects the reflectivity and surface shape of the mirrors. [1] The Swiss Light Source has typically relied on in-situ plasma cleaning to control mirror contamination and the PolLux scanning transmission X-ray microscopy (STXM) beamline has also been employing further contamination reduction strategies in recent years. In particular, in 2014 we installed a 1 × 10 −8 mbar background pressure of O 2 on the PolLux first mirror chamber. We present a history of efforts to control optical contamination at the PolLux beamline and report on the observed efficiencies of the different processes employed both for the in-vacuum optics and critical components of the frequently vented STXM experiment chamber.