The recovery of high‐purity nickel electron irradiated at 27 K has been observed by simultaneous measurement of the electrical resistivity and the magnetic after‐effect (MAE). A strong MAE observed at about 55 K anneals out in the substages ID and IE simultaneously with the electrical resistivity. In both stages ID and IE the same value of the activation energy of recovery EM = (0.155 ± 0.02) cV was found from both types of measurement. Models describing the recovery in stages ID and IE in nickel by the annealing of a single type of defect configuration are strongly supported.
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Lampert et al. (1972) studied this question.
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