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We present a simplified method to employ laser interference lithography for the fabrication of ordered nanostructures. Neither resist, nor an elaborate fabrication process was needed. Four-beam interference patterns generated in this work included periodic arrays of holes in GaAs, covered with SiO(2) bubbles, and they were directly written into the sample. The diameters of the smallest holes were less than 30 nm. We propose a model to interpret the results.
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Tan et al. (2009) studied this question.
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