January 1, 2008Journal of The Electrochemical Society

Physical and Electrical Properties of Hafnium–Zirconium–Oxide Films Grown by Atomic Layer Deposition

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Physical and Electrical Properties of Hafnium–Zirconium–Oxide Films Grown by Atomic Layer Deposition, Bang, Seokhwan, Lee, Seungjun, Jeon, Sunyeol, Kwon, Semyung, Jeong, Wooho, Kim, Seokhoon, Jeon, Hyeongtag

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Bang et al. (2008) studied this question.

synapsesocial.com/papers/6ab9e181cf96ab8a07034ab3 https://doi.org/10.1149/1.2945908

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Physical and Electrical Properties of Hafnium–Zirconium–Oxide Films Grown by Atomic Layer Deposition

Abstract

Discussion

Cite This Study

Physical and Electrical Properties of Hafnium–Zirconium–Oxide Films Grown by Atomic Layer Deposition

Abstract

Discussion

Cite This Study

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