Investigation of N Type Metal TiAlC by Thermal Atomic Layer Deposition Using TiCl4 and TEA as Precursors, Xiang, Jinjuan, Ding, Yuqiang, Du, Liyong, Xu, Chongying, Li, Tingting, Wang, Xiaolei, Li, Junfeng, Zhao, Chao
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Xiang et al. (2016) studied this question.
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