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Proposed silicon on silicon oxide 4x4 matrix multiplier for use in refractive index measurements, based on the Advanced Micro Foundry deep ultraviolet process. Agreement between simulated spectra and analytic design spectra demonstrate the intended performance of the components given a 1550 nm wavelength spectrum analysis. Intended purpose of the design includes optical damage analysis of the cladding, and photonic chip refractive index analysis following sub-threshold laser ablation. Femtosecond multi-shot tuning of refractive index is not a recommended application, due to round trip-losses causing quality factor and transfer function degradation.
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Cael Warner (2026) studied this question.
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