Innovations enhance non-destructive metrology, improving critical dimensions measurement in nanostructures, indicating greater speed and sensitivity.
Coherent Fourier Scatterometry (CFS) enables low-power, high- resolution, non-destructive metrology for nanoscale structures. Recent advancements have extended its applications to improving the measurement of critical dimensions, such as steep-sidewall angles of fabricated nanostructures and the detection and shape determination of defects for semiconductor and power electronics applications. Innovations like beam scanning, multi-beam setups, and synthetic optical holography enhance its speed and sensitivity, making CFS increasingly viable for industrial in-line inspection.
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Paul et al. (2025) studied this question.
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