Beam scanning coherent Fourier scatterometry

The significance of precise metrology in various industries, particularly within manufacturing plants, is undeniable, especially as components and devices continue to undergo miniaturization. The emergence of nanomanufacturing further amplifies the necessity for meticulous measurement techniques. Coherent Fourier scatterometry is a non-imaging, model-based, bright-field optical metrology technique used for retrieving complex geometric parameters of nanostructures. However, the scanning time has been a limiting factor in its wider adoption as a commercial metrology tool. To address this limitation, we propose a novel design utilizing a galvo mirror for faster scanning, offering significant improvements in scan speed.