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October 3, 2025Journal of Physics MaterialsOpen Access

Off-axis RF-sputtered barium titanate thin films for next-generation electro-optic devices

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Authors

MSMd Saiful Islam SumonThe Ohio State UniversityKLKatelyn LazarenoThe Ohio State UniversityDCDavid A. CarpenterThe Ohio State University

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Overview

Off-axis RF-sputtered films show record-high electro-optic coefficient and minimized optical losses.

Key Points

  • The barium titanate films exhibit a record-high electro-optic coefficient of ~550 pm/V.
  • Films grown using RF-sputtering demonstrate exceptional crystallinity, with a FWHM of ~0.03°.
  • The root mean square roughness of the surface is only 0.23 nm, ensuring minimal optical losses.
  • This high-quality material enables efficient BTO-on-silicon waveguides for future electro-optic devices.

Cite This Study

Sumon et al. (2025) studied this question.

synapsesocial.com/papers/68e034f7f0e39f13e7fa3034https://doi.org/10.1088/2515-7639/ae0ef0
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Also Consider

Synapse has enriched 5 closely related papers on similar clinical questions. Consider them for comparative context:

  1. 1RF-Sputtered Barium Titanate Thin Films for Compact and Ultrahigh-Speed Electro-Optical Modulators2025
  2. 2Enhanced Electro‐Optic Coefficients in Single‐Crystalline BaTiO 3 Thin Films Enabled by Domain Alignment2024 · 24 citations
  3. 3Crystal domain orientation control of epitaxial BaTiO3 films integrated on silicon for large electro-optic response2025 · 6 citations
  4. 4Enhanced linear electro-optic effect in BaTiO3 nanocrystal films prepared by electrophoretic deposition2025
  5. 5Wafer-scale Hybrid Molecular Beam Epitaxy of BaTiO 3 and SrTiO 3 on Silicon2026 · 1 citations