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June 27, 2024

Improved breakdown voltage and threshold voltage in normally-off p-GaN HEMT with L-shape gate metal and MIS structure

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Authors

JYJun YangLWLicheng WuCWChuanmin Wang

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Yang et al. (2024) studied this question.

synapsesocial.com/papers/68e6300ab6db6435875c239bhttps://doi.org/10.1117/12.3032767
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Also Consider

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  1. 1Enhanced breakdown voltage for p-GaN gate AlGaN/GaN HEMT on AlN/Si with triple trenches: A simulation study2024 · 3 citations
  2. 2Threshold Voltage Modulation and Gate Leakage Suppression of Enhancement‐Mode GaN HEMT by Metal/Insulator/p‐GaN Gate Structure2024 · 5 citations
  3. 3Semiconducting p-GaN gate HEMT with avalanche-like non-destructive breakdown capability2026 · 1 citations
  4. 4A new gate design combined MIS and p-GaN gate structures for normally-off and high on-current operation2024
  5. 5Design and Performance Investigation of a Dual p-GaN Recessed Gate High Electron Mobility Transistors for High Threshold Voltage Applications2026