This study investigates pristine and doped ZnO thin films fabricated via the sol-gel technique, aiming to address efficiency challenges when used as transparent conductive oxide (TCO) layers in thin-film solar cells. ZnO was first doped with aluminum (Al), and subsequently with both Al and reduced graphene oxide (rGO), to evaluate the individual and combined effects of these dopants. The optimal pH value for the ZnO structure was initially determined, with the film produced at pH 9 exhibiting the most favorable characteristics. Al doping was then optimized at a ratio of Al/(Al + Zn) = 0.2, followed by optimization of the graphene content at 1.5 wt%. In this context, the structural, optical, and electrical properties of pristine ZnO, Al-doped ZnO (AZO), and Al and graphene co-doped ZnO (Gr:AZO) thin films were systematically investigated. These films were integrated as TCO layers into Cu2SnS3 (CTS)-based thin-film solar cells fabricated via physical vapor deposition (PVD). The cell architecture employed an 80 nm pristine ZnO window layer, while the doped ZnO films (300 nm) served as TCO layers. To assess the influence of the chemically deposited top layers, device performance was compared against a reference cell in which all layers were fabricated entirely using PVD. As expected, the reference cell exhibited superior performance compared to the cell whose AZO layer deposited chemically; however, the incorporation of both Al and graphene significantly enhanced the efficiency of the chemically modified cell, outperforming devices using only pristine or singly doped ZnO films. These results demonstrate the promising potential of co-doped solution-processed ZnO films as an alternative TCO layer in improving the performance of thin-film solar cell technologies.
Özbek et al. (Sat,) studied this question.