Epitaxial strategy for developing efficient light-emitting diodes in optoelectronic applications, suggesting new manufacturing possibilities.
We investigated an epitaxial strategy for fabricating MoS₂ light-emitting diodes (LEDs). A full-coverage MoS₂ active layer was grown on p-type GaN, and n-type ZnO nanorods were then vertically aligned on the MoS₂ to form a p-n junction with negligible damage to the MoS₂. All materials have nearly matched hexagonal structures, enabling single-crystal alignment. Although the continuous MoS₂ film formed multiple layers (MLs), the ZnO/MoS₂/GaN heterostructure yielded favorable optical characteristics of the ML-MoS₂, including internal quantum efficiency comparable to that of the single-layer MoS₂. The ZnO/MoS₂/GaN LED exhibited stable A and B exciton emissions, which imply direct bandgap transition with spin-orbit coupling. Without mechanically exfoliated or transferred 2D films, this epitaxial approach satisfies the key requirements for fabricating 2D-based optoelectronic and quantum light sources. The strength of epitaxy, such as large-scale scalability and multiple quantum-well formation, will further advance 2D optoelectronics, making them more practical and efficient.
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Rahmatulloh et al. (2026) studied this question.
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