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July 1, 1983Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena

Surface roughness scattering at the Si–SiO2 interface

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Authors

SGStephen M. GoodnickArizona State UniversityRGRichard G. GannNational Institute of Standards and TechnologyJSJames R. SitesColorado State University

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Cite This Study

Goodnick et al. (1983) studied this question.

synapsesocial.com/papers/69ffe7da831589f3542daf68https://doi.org/10.1116/1.582696
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