What question did this study set out to answer?

This work aims to outline fundamental concepts of chemical reactions essential for CVD and ALD applications.

Fundamentals of Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) and Safety Management of Chemical Substances Part 2 : Fundamentals of Chemical Reaction Kinetics

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Explains chemical reaction basics for CVD and ALD processes, highlighting their significance in technology.

This work aims to outline fundamental concepts of chemical reactions essential for CVD and ALD applications.
Discussed the principles of chemical reactions related to CVD and ALD processes.
Outlined basic concepts in reaction kinetics for practical applications.
Established the foundational knowledge required for understanding CVD and ALD processes.
Identified key reaction analysis techniques relevant to these deposition methods.

Atsushi SEKIGUCHI (2026) studied this question.

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