Vaporization of liquid raw materials frequently used in chemical vapor deposition (CVD) and atomic layer deposition (ALD) methods is explained in this lecture. At first, saturated vapor pressure is considered. Saturated vapor pressure pSA is the pressure when the incidence frequency ΓA (the rate at which raw material molecules A enter the liquid from gas) is equal to the evaporation rate vEA (the rate at which they evaporate from liquid to gas). From this incidence frequency ΓA, the evaporation rate vEA can be determined from the saturated vapor pressure pSA.
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Atsushi SEKIGUCHI (2026) studied this question.
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