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November 15, 1993Applied Physics Letters

Reactive ion etching of gallium nitride in silicon tetrachloride plasmasa)

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IAI. AdesidaAMA. MahajanEAE. Andideh

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Adesida et al. (1993) studied this question.

synapsesocial.com/papers/6a11fa32ccefb17cd5cccfe7https://doi.org/10.1063/1.110331
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