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May 27, 1991Applied Physics Letters

High electron mobility GaN/AlxGa1−xN heterostructures grown by low-pressure metalorganic chemical vapor deposition

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MKM. Asif KhanGovernment of the United States of AmericaJHJ. M. Van HoveOpticaJKJ. N. KuzniaOmega Optics (United States)

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Khan et al. (1991) studied this question.

synapsesocial.com/papers/6a6fbde6e5469ee92be0986chttps://doi.org/10.1063/1.104886
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Also Consider

Synapse has enriched 5 closely related papers on similar clinical questions. Consider them for comparative context:

  1. 1Growth of high optical and electrical quality GaN layers using low-pressure metalorganic chemical vapor deposition1991 · 174 citations
  2. 2Effect of background doping on the electron mobility of (Al,Ga)As/GaAs heterostructures1981 · 20 citations
  3. 3Stimulated Emission Near Ultraviolet at Room Temperature from a GaN Film Grown on Sapphire by MOVPE Using an AlN Buffer Layer1990 · 200 citations
  4. 4High mobility of two-dimensional electrons at the GaAs/n-AlGaAs heterojunction interface1980 · 70 citations
  5. 5Properties of AlxGa1−xN films prepared by reactive molecular beam epitaxy1982 · 274 citations