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The performance of a 5-nm gate length monolayer MoS 2 transistor is benchmarked against an ultrathin body Si transistor of similar dimensions and the ITRS requirements for 2026 low operating power (LOP) technology. The MoS 2 transistor has a subthreshold slope of 70 mV/dec, an on -/off-current ratio of 4.8 × 10 4 , a drive current of 238 μA/μm, a peak transconductance of 2.65 mS/μm, a total capacitance of 0.164 fF/μm, and an intrinsic switching delay of 0.276 ps. These numbers for the silicon competitor are 79 mV/dec, 1.8 × 10 4 , 89 μA/μm, 1.22 mS/μm, 0.0733 fF/μm , and 0.331 ps, respectively. The heavier effective mass of the MoS 2 significantly reduces the direct source-drain leakage current, and it increases the drive current and the transconductance. The performance metrics of MoS 2 transistor are comparable to the ITRS 2026 LOP technology requirements.
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Alam et al. (2012) studied this question.
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