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X‐ray photoelectron spectroscopic analysis of a reactively sputter ion plated titanium nitride film showed the surface to be oxidised to TiO 2 , with a sub‐layer of oxynitride. Argon ion etching gave a depth profile of the film, but it preferentially sputtered titanium nitride, and caused mixing of TiO 2 and TiN phases to form titanium oxynitrides. Titanium oxynitride was also produced by nitrogen ion implantation into titanium metal with a surface layer of titanium dioxide.
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Robinson et al. (1984) studied this question.
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