What question did this study set out to answer?

The aim is to improve the manufacturability of inverse-designed photonic integrated circuits (PICs) by optimizing mask design.

PRISM: Photonics-Informed Inverse Lithography for Manufacturable Inverse-Designed Photonic Integrated Circuits

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Randomized trial demonstrates enhanced performance in photonic integrated circuits, suggesting improved manufacturability in high-yield applications.

The aim is to improve the manufacturability of inverse-designed photonic integrated circuits (PICs) by optimizing mask design.
Introduced PRISM, a workflow for photonics-informed inverse lithography optimizing mask designs.
Synthesized compact calibration patterns to reduce required fabrication data.
Trained a physics-grounded differentiable digital twin for gradient-based optimization.
PRISM increased post-fabrication performance of inverse-designed components significantly.
Yield rates improved markedly while calibration area and turnaround time were reduced.
The optimization process democratized access to high-yield photonic hardware production.

Zhou et al. (2026) studied this question.

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Randomized trial demonstrates enhanced performance in photonic integrated circuits, suggesting improved manufacturability in high-yield applications.