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August 15, 1981Applied Physics Letters

Chemical etching and cleaning procedures for Si, Ge, and some III-V compound semiconductors

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DAD. E. AspnesNorfolk State UniversityASA. A. StudnaAT&T (United States)

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Aspnes et al. (1981) studied this question.

synapsesocial.com/papers/6a6f5c01f44fa9f079dcc95bhttps://doi.org/10.1063/1.92705
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