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July 1, 1978Applied Physics Letters

Oxidation mechanisms in WSi2 thin films

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Authors

SZS. ZirinskyIBM (United States)WHW. HammerIBM (United States)FDF. M. d’HeurleUniversity of North Carolina at Chapel Hill

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Zirinsky et al. (1978) studied this question.

synapsesocial.com/papers/6a6f80976c240de38cdb8024https://doi.org/10.1063/1.90151
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