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January 1, 1980Journal of Applied Physics

Thin film interaction between titanium and polycrystalline silicon

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Authors

SMS. P. MurarkaRensselaer Polytechnic InstituteDFD. B. FraserIntel (United States)

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Murarka et al. (1980) studied this question.

synapsesocial.com/papers/6a6f80d535aa2c282ce0dc35https://doi.org/10.1063/1.327378
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Also Consider

Synapse has enriched 5 closely related papers on similar clinical questions. Consider them for comparative context:

  1. 1Physical and X‐Ray Study of the Disilicides of Titanium, Zirconium, and Hafnium1956 · 68 citations
  2. 2Handbook of Thin Film Technology1971 · 2,772 citations
  3. 3Thin Film Processes1980 · 888 citations
  4. 4Growth Kinetics Observed in the Formation of Metal Silicides on Silicon1972 · 179 citations
  5. 5Silicide formation in thin cosputtered (titanium + silicon) films on polycrystalline silicon and SiO2.1980 · 131 citations