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January 1, 1980Journal of Applied Physics

Silicide formation in thin cosputtered (titanium + silicon) films on polycrystalline silicon and SiO2.

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Authors

SMS. P. MurarkaRensselaer Polytechnic InstituteDFD. B. FraserIntel (United States)

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Murarka et al. (1980) studied this question.

synapsesocial.com/papers/6a851ed5df831772a6d69d5chttps://doi.org/10.1063/1.327379
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Also Consider

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