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May 1, 1994Japanese Journal of Applied Physics

Optical Characteristics of Amorphous Silicon Nitride Thin Films Prepared by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition

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TITakashi InukaiMeijo UniversityKOKenichi OnoNara Institute of Science and Technology

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Inukai et al. (1994) studied this question.

synapsesocial.com/papers/6a6ff820ac440176ef289fc8https://doi.org/10.1143/jjap.33.2593
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