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March 1, 1992Journal of The Electrochemical Society

Etch Rates and Selectivities of Citric Acid/Hydrogen Peroxide on GaAs , Al0.3Ga0.7As , In0.2Ga0.8As , In0.53Ga0.47As , In0.52Al0.48As , and InP

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Authors

GDG. DeSalvoNorthrop Grumman (United States)WTWen Feng TsengNational Institute of Standards and TechnologyJCJ. ComasNational Institute of Standards and Technology

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Cite This Study

DeSalvo et al. (1992) studied this question.

synapsesocial.com/papers/6a706640febe604dd7092faehttps://doi.org/10.1149/1.2069311
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