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As part of a study of the possible application of polymerisable Langmuir‐Blodgett (LB) films as ultra‐fine‐line e‐beam resists, an investigation of the variation of film structure of 22‐tricosenoic acid with differing deposition conditions has been made. Unexpected effects with significant implications for deposition speed and resist sensitivity have been observed, and the new techniques for film characterisation developed during the investigation have resulted in a revised model of deposition explaining the observed independence of the disorder causing optical scattering and the macroscopic features observed by polarised microscopy.
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Peterson et al. (1985) studied this question.
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