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January 3, 2003Applied Physics Letters

Effects of crystallization on the electrical properties of ultrathin HfO2 dielectrics grown by atomic layer deposition

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HKHyoungsub KimAnsan UniversityPMPaul C. McIntyreSLAC National Accelerator LaboratoryKSKrishna C. SaraswatStanford University

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Kim et al. (2003) studied this question.

synapsesocial.com/papers/6a70902df44fa9f079de3ba3https://doi.org/10.1063/1.1533117
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