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January 1, 1986IEEE Transactions on Plasma Science

Mechanisms for Power Deposition in Ar/SiH4 Capacitively Coupled RF Discharges

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MKMark J. Kushner

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Mark J. Kushner (1986) studied this question.

synapsesocial.com/papers/6a70969bfebe604dd7095c03https://doi.org/10.1109/tps.1986.4316522
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