The authors have determined the critical composition x c of the percolation threshold in polycrystalline Al x Si 1-x thin films with a new method, using structural arguments only. The result x c =(0.55+or-0.05) agrees with the results of the commonly used methods. Moreover, the model explains the wide spread of experimental values of x c as reported in the literature.
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Reiß et al. (1985) studied this question.
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