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November 1, 1985Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena

Self-aligned TiSi2 for bipolar applications

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Authors

YKYoungil KohSeoul National UniversityFCForest Shih-Sen ChienTunghai UniversityMVM. Vora

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Cite This Study

Koh et al. (1985) studied this question.

synapsesocial.com/papers/6a76553ff8a4cd622d0883e0https://doi.org/10.1116/1.582941
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