The influence of bombardment by high-energy particles on the c -axis orientation of ZnO films was investigated for DC diode sputtering with a hemispherical electrode system and for an RF cylindrical magnetron sputtering system. It was found that one of the criterions for preparing highly [00·2] oriented films is to decrease the flux and energy of high-energy particles bombarding the ZnO film without decreasing the deposition rate of the film. This criterion presents a guide to improving the degree of c -axis orientation in ZnO film in the fabrication of oriented film.
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Tominaga et al. (1982) studied this question.
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