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July 1, 1984Applied Physics Letters

Air as an adjustable insulator for C-V and G-V analysis of semiconductor surfaces

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Authors

JMJohn MorelandPurdue University NorthwestJDJeff DruckerArizona State UniversityPHP. K. HansmaUniversity of California, Santa Barbara

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Implication

Experimental study demonstrates standard capacitor response across an air insulator on n-type silicon, suggesting an adjustable method for semiconductor surface analysis.

Key Points

  • To evaluate the feasibility of using an adjustable air gap as the insulating layer for differential capacitance and conductance measurements on semiconductor surfaces.
  • Fabricated a metal-air-semiconductor capacitor using a lead (Pb) disk electrode suspended 1700–3600 Å over an n-type Si ⟨111⟩ substrate.
  • Measured differential capacitance versus voltage (C-V) and differential conductance versus voltage (G-V) across the adjustable air dielectric.
  • Obtained stable differential capacitance and conductance curves across electrode-to-surface spacings ranging from 1700 to 3600 Å.
  • Reproduced the voltage-dependent electrical response profiles characteristic of conventional solid metal-oxide-semiconductor capacitors without requiring a permanent oxide layer.

Cite This Study

Moreland et al. (1984) studied this question.

synapsesocial.com/papers/6a7e318dd2dab736758561f9https://doi.org/10.1063/1.95003
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