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February 1, 1967Applied Physics Letters

Evidence of Hole Injection and Trapping in Silicon Nitride Films Prepared by Reactive Sputtering

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Authors

SHSheng HuHunan Xiangdian Test Research Institute (China)DKD. R. KerrIBM (United States)LGL. V. GregorIBM (United States)

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Cite This Study

Hu et al. (1967) studied this question.

synapsesocial.com/papers/6a7e6a391bf3cbbc304fa144https://doi.org/10.1063/1.1754868
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