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Extremely compact low-loss four channel arrayed waveguide grating (AWG) with a channel spacing of 600 GHz was demonstrated with InP-based photonic wire waveguides using III–V semiconductor on insulator (III–V-OI) on Si wafer. The III–V-OI substrate was fabricated by direct wafer bonding of an InGaAsP/InP wafer to a thermally oxidized Si wafer. The InGaAsP ultrahigh index contrast photonic wire waveguide allowed the size reduction of the AWG down to 147×92 µm 2 . The measured insertion loss was approximately 6 dB and the crosstalk of around -10 dB was obtained. The transmission power nonuniformity of the four wavelength channel was less than 1 dB.
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Takenaka et al. (2009) studied this question.
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