1.3 μm InAsyP1−y/InP strained-layer quantum well laser diodes grown by metalorganic chemical vapor deposition

We report on the metalorganic chemical vapor deposition (MOCVD) growth of InAsyPl1−y/InP strained layer quantum wells and the successful lasing of novel InAsyP1−y/InP strained layer quantum well laser diodes at 1.3 μm for the first time. Full width at half maximum of room temperature photoluminescence was as narrow as 30.1 meV with a peak wavelength of 1.29 μm. A very low threshold current density of 0.45 kA/cm2 was obtained on broad contact lasers with a cavity length of 900 μm.