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January 1, 1971Journal of The Electrochemical SocietyOpen Access

Hydrides and Hydroxyls in Thin Silicon Dioxide Films

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Authors

KBK. H. BeckmannUniversity of CanberraNHN. J. HarrickUniversity of California, Riverside

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Beckmann et al. (1971) studied this question.

synapsesocial.com/papers/6a82a4490de57fd8eeb28a03https://doi.org/10.1149/1.2408122
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