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January 1, 1972Journal of The Electrochemical SocietyOpen Access

Etch Channel Formation during Anodic Dissolution of N-Type Silicon in Aqueous Hydrofluoric Acid

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MTM. J. J. TheunissenPhilips (Finland)

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M. J. J. Theunissen (1972) studied this question.

synapsesocial.com/papers/6a833ab48847014bd6990939https://doi.org/10.1149/1.2404201
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