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November 6, 1989Applied Physics Letters

Universal energy dependence of physical and ion-enhanced chemical etch yields at low ion energy

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CSChristoph SteinbrüchelRensselaer Polytechnic Institute

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Christoph Steinbrüchel (1989) studied this question.

synapsesocial.com/papers/6a83b3c9fd07e211f9fe196ahttps://doi.org/10.1063/1.102336
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