Crystallographic orientation of laser-recrystallized Ge films on fused quartz

Crystallographic orientation of laser-recrystallized Ge films on fused quartz has been investigated using a microprobe x-ray diffractometer (μXD) that has a collimated x-ray beam of 30 μm in diameter and a position-sensitive proportional counter. It has been found that the crystallographic orientations normal to the substrate surface were near 〈110〉 or 〈111〉. Tilt angle of the grain from 〈110〉 or 〈111〉 was ≲10°. Orientation distribution was represented by means of a stereographic projection.