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September 1, 1983Journal of The Electrochemical Society

Substrate Biasing for Plasma Etching

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TMT. D. MantéiCentre National de la Recherche Scientifique

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T. D. Mantéi (1983) studied this question.

synapsesocial.com/papers/6a87feb4c0c64b7dddeb3397https://doi.org/10.1149/1.2120130
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