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May 1, 1982Applied Physics Letters

Detection of CF2 radicals in a plasma etching reactor by laser-induced fluorescence spectroscopy

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PHP. J. HargisOak Ridge National LaboratoryMKMark J. KushnerUniversity of Michigan

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Hargis et al. (1982) studied this question.

synapsesocial.com/papers/6a87ff112d13770579f4ccd5https://doi.org/10.1063/1.93257
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