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July 1, 1986Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena

Lithographic approach for 100 nm fabrication by focused ion beam

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Authors

SMShinji MatsuiUniversity of HyogoKMKatsumi MoriThe University of TokyoKSK. SaigoInstitut de Biologie et de Chimie des Protéines

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Matsui et al. (1986) studied this question.

synapsesocial.com/papers/6a88215f054eefc4d776f521https://doi.org/10.1116/1.583524
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