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January 1, 1990IEEE Transactions on Electron Devices

Nitridation and post-nitridation anneals of SiO/sub 2/ for ultrathin dielectrics

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PWP.J. WrightMarine ScotlandAKAhmad KermaniThe Ohio State UniversityKSKrishna C. SaraswatStanford University

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Wright et al. (1990) studied this question.

synapsesocial.com/papers/6a88eb40cd9902a7ca12644bhttps://doi.org/10.1109/16.57134
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