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August 1, 1979Journal of The Electrochemical SocietyOpen Access

Selective Etching of Silicon Dioxide Using Reactive Ion Etching with CF 4 ‐ H 2

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LEL. M. EphrathBoston College

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L. M. Ephrath (1979) studied this question.

synapsesocial.com/papers/6a8932ee991508d05dc97572https://doi.org/10.1149/1.2129291
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