Effect of Activation of Oxygen by Electron Cyclotron Resonance Plasma on the Incorporation of Pb in the Deposition of Pb(Zr,Ti)O 3 Films by DC Magnetron Reactive Sputtering

Pb(Zr,Ti)O3 films were deposited by DC magnetron reactive sputtering on Pt/Ti/SiO2/Si and Pt/SiO2/Si substrates. The activation of oxygen by electron cyclotron resonance (ECR) plasma facilitated the incorporation of Pb. This enabled the fabrication of Pb(Zr,Ti)O3 films with stoichiometric composition and perovskite structure even at a high Zr/Ti film concentration ratio and high substrate temperature and on Pt/SiO2/Si substrates where the pyrochlore second phase was usually observed when the films were deposited without oxygen activation.